For over 30 years, Moses Lake Industries has been a source of innovation in the manufacture of high performance, ultra-high purity chemical solutions. In the tradition of our parent company, Tama Chemicals, we are driven by a commitment to continuous improvement to meet the evolving needs of our customers. Guided by our core values, MLI has grown to be a leading global supplier of high-performance chemicals to the semiconductor and flat panel industries.
2015 – Publication of Sustainability Report (GRI)
2014 – Hiroyuki Era assumes role of President
2013 – Moses Lake Industries opens office in Korea
2012 – Moses Lake Industries opens a wholly-owned subsidiary in Xi’an, China – Moses Lake Xi’an Chemical Industries
2012 – Publication of Environmental Health, Safety and Security Report
2011 – MLI begins R&D effort in Chip Substrate Packaging electrolyte and additives
2010 - Moses Lake Industries expands R&D with a facility in Portland, Oregon, USA in cooperation with the University of Portland
2009 – MLI’s 25th Anniversary
2008 – Moses Lake Industries expands internationally with a wholly-owned subsidiary in Dalian, China – Moses Lake Dalian Chemical Industries
2008 – MLI begins R&D effort in Through Silicon Via and Wafer Level Plating electrolyte and additives
2007 – MLI begins R&D effort in Damascene additives
2003 – ISO 9001:2000 certification received
2002 – ISO 14001 certification received
2001 – Manufacture of metallic plating additives products begins.
2001- Mike Harvey assumes role of President
2000- Manufacture of high purity copper electrolyte solution begins
2000- ISO 9002 certification received
1999 – Manufacture of chemical mechanical planarization (CMP) materials begins
1997- Manassas, Virginia, USA plant opens
1992 – Manufacture of semiconductor chemical vapor deposition (CVD) materials begins
1986 – Manufacture of TMAH begins
1984 – Moses Lake Industries is established as a wholly owned subsidiary of Tama Chemicals Co., Ltd.