Baseline Damascene Accelerator
The Baseline Damascene Accelerator is prepared and packaged with methods that produce a high purity formulation with very
low metals and low Na+ content. The Na+ content is reduced to <10ppm versus typical accelerators with Na+ content of >2500ppm.
The accelerator provides rapid, void-free bottom-up fill capability. MLI P/N: MCP-RA1
Baseline Damascene Leveler
The Baseline Damascene Leveler provides excellent wafer appearance and low surface roughness with good leveling capability at a
wide range of concentrations. It demonstrates improvement in bottom-up fill capability over a wide range of concentrations through field
suppression-based fill mechanism. In addition, it produces high purity deposits with impurity levels at <10ppm for Cl, S, C and O.
MLI P/N: MCP-RL14
Baseline Damascene Suppressor
The Baseline Damascene Suppressor provides good wafer wetting through low surface tension, moderate cloud point, and low foaming which allows for
low defect levels and provides moderate field suppression characteristics. MLI P/N: MCP-RS40
Mission
VERTICAL LINE DAMASCENE ADDITIVES
MLI is actively developing advanced Damascene additives for sub-45nm technology nodes. MLI is developing additives that provide a high rate of
bottom-up fill, excellent performance for thin seed plating, high deposit purity, and excellent planarization.
DAMASCENE RESEARCH ACTIVITIES